CMS Series
Thin Film Deposition System Platform
CMS (Combinatorial Materials Science) Series
Advanced Research System Utilizing Sputtering or Electron Beam Techniques
Overview
- Extremely capable, advanced research tool
- Designed to accommodate specific thin film applications such as GMR, CMS, Semiconductor, Nanoscale devices, Photonics, and Photovoltaics
- Unique system design can be configured for true Ultra High Vacuum performance
- Field tested and proven design
Applications
- Giant Magnetoresistance (GMR)
- Combinatorial Materials Science (CMS)
- Semiconductor
- Superconductor
- Nanoscale devices
- Photonics
- Photovoltaics (PV)
- OLED
- Organic films
FEATURES
Chamber
- Adaptable chamber, base plate, and substrate options
- 18" D x 15" H SS process chamber
Substrate Handling
- Rotating substrate platen for up to 150mm (6") substrates
- Substrate heating to 800°C with quartz lamp heater
- Single or multi-wafer load lock with manual or computer controlled sample transfer
- High precision PID temperature control loop (when equipped with substrate heating)
Pumping & Gauging
- 1500 l/s Cryo pump
- Wide range vacuum gauge, atm to 1x10-10 torr
- High precision closed loop pressure control (both upstream and downstream for sputtering applications)
Deposition Sources
- Pneumatically actuated source and substrate shutters
- Configurable with six or more magnetron deposition sources
- Cross contamination shielding (when applicable)
Quality & Safety
- Computer control with manual or fully automatic operation
- CE mark, UL listing, CSA, NRTL, and other industry recognized testing certifications available
- Extruded aluminum framework with enclosure panels
- Single service drop power distribution module
OPTIONS
Chamber
- UHV configuration
- 24" chamber upgrade
- Multi-process chamber cluster tool configurations
Pumping & Gauging
- Maglev turbo pump
- Dry pumping package
- Residual gas analyzer for in-situ monitoring of process gases or chamber constituents
Deposition Sources
- Available Linear multi-pocket UHV electron beam evaporation source (multi-technique options available)
- HV or UHV compatible magnetron sputter sources
Substrate Handling
- Rotating substrate platen for up to 200mm (8") substrates
- Substrate biasing for sample cleaning (typically RF plasma to remove native oxide layers)
- Substrate bias during deposition to influence features of film microstructure (such as crystal orientation), improve film densification, promote film adhesion, and promotes improved film homogeneity of co-sputtered alloy films
- Substrate heating to 1100°C with element style heater
- Substrate cooling (Liquid and/or LN2)
- Sample flip fixture for coating both sides of the substrate
- Film shaping tool (blade mounted to high precision computer controlled arm)
- Indexable magnetic field at substrate
- In-situ film analysis (Optical process monitor, RHEED, or spectroscopic ellipsometer)
Architecture Overview
Kurt J. Lesker Company® eKLipse™ Controls Software is utilized on all KJLC platforms. The eKLipse™ controls platform utilizes a .NET application running on a Windows PC for its User Interface and Recipe Editor. Equipment automation is accomplished via a standalone Real Time Controller.
Recipes
- Graphical Recipe Builder – Easily create recipes by clicking on the desired component and set that item's attributes
- Scripted Recipe Builder – A more traditional "scripted" recipe editor exposes more details for setting or checking the value of any system component during a process.
Reliable
- Real Time Controller – The system operates independently of the Windows software package and will continue the recipe should the software / computer malfunction.
- Independent Thermal Evaporation Thin Film Control – There is no third party software requiring a "handshake" or "handoff" between the Systems Manufacturers software and the thin film controller's software.
Unlimited Recipes, (import/export capable)
- Unlimited recipes with user security level features
- Recipe import/export capability (for transferring recipes between similarly equipped tools)
- Any recipe step can be configured to allow the user to alter a value, enabling process condition changes, without affecting the master recipe. As an example, at the time of execution, the recipe can prompt the user for the desired deposition thickness, or power setting.
- Consistent User experience across all deposition techniques and KJLC platforms (Sputter, Thermal, EBeam, ALD)
- Multi chamber and multi PC control for cluster tools
Custom Chart Recorder and Datalogging
- Custom Chart with up to 10 simultaneous plots
- Chart Recorder can be used to display any setpoint or feedback parameter
- Automatic datalogging of each recipe step for all recipes
- Chart data and configuration can be saved
- Graphical selection of signals to be recorded
Custom Maintenance Counters
- Custom Maintenance Counters are available for each component
- Periodic Maintenance interlocks and recipe checks can be configured for any maintenance counter
- Sputter Target kiloWatt*Hour and custom material usage tracking
User Security
- Supports multiple user accounts and password levels with custom security access for recipes and screens
- Software screen access can be customized per user
- Recipe editing and manual operation features can be assigned on a per user basis;
- Users with full access have the ability to edit recipes and control interlocks. Restricted access users will be limited to running certain recipes and have no control over interlocks.
- Every control object can be assigned to a standard user security level.
- Individual screen access can be separately assigned to any user.
Multi User Facility Features
- System event log captures all user login/logout events, all recipes executed, and system status messages
- Interlocking of vacuum and deposition equipment provides continuous system status monitoring while restricting unapproved system usage (no need to 'power off' system screen or PC)
Remote Support Utility and Apps
- Customized Version of TeamViewer allows remote support (free Android and IOS apps)
- Remote connection supports system monitoring/control and file transfer
