Ultra High Vacuum Systems
Ultra High Vacuum
Fully Bakeable
N/A
Magnetron Sputtering Sources
12
6+
Electron Beam Source
N/A
Multi Pocket, 5kW or 10kW Power Supplies
Platen
150mm Substrates
- Heating Up to 1000°C
- Water-Cooling
- RF Bias
200mm Substrates
- Heating Up to 1100°C
- Water-Cooling
- RF Bias
Load Lock
Single or Multi-Cassette
Single or Multi-Cassette
Software
Full eKLipse™ Control Software/Hardware Suite
Full eKLipse™ Control Software/Hardware Suite
Ultra High Vacuum
Fully BakeableMagnetron Sputtering Sources
12Electron Beam Source
N/APlaten
150mm Substrates
- Heating Up to 1000°C
- Water-Cooling
- RF Bias
Load Lock
Single or Multi-CassetteSoftware
Full eKLipse™ Control Software/Hardware SuiteCMS (Combinatorial Materials Science) SeriesAdvanced Research System Utilizing Sputtering or Electron Beam Techniques
More InfoUltra High Vacuum
N/AMagnetron Sputtering Sources
6+Electron Beam Source
Multi Pocket, 5kW or 10kW Power SuppliesPlaten
200mm Substrates
- Heating Up to 1100°C
- Water-Cooling
- RF Bias