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Ultra High Vacuum Systems

LAB Line
CMS (Combinatorial Materials Science) Series

Ultra High Vacuum

Fully Bakeable

N/A


Magnetron Sputtering Sources

12

6+


Electron Beam Source

N/A

Multi Pocket, 5kW or 10kW Power Supplies


Platen

150mm Substrates

  • Heating Up to 1000°C
  • Water-Cooling
  • RF Bias

200mm Substrates

  • Heating Up to 1100°C
  • Water-Cooling
  • RF Bias

Load Lock

Single or Multi-Cassette

Single or Multi-Cassette


Software

Full eKLipse™ Control Software/Hardware Suite

Full eKLipse™ Control Software/Hardware Suite

Ultra High Vacuum

Fully Bakeable

Magnetron Sputtering Sources

12

Electron Beam Source

N/A

Platen

150mm Substrates

  • Heating Up to 1000°C
  • Water-Cooling
  • RF Bias

Load Lock

Single or Multi-Cassette

Software

Full eKLipse™ Control Software/Hardware Suite

Ultra High Vacuum

N/A

Magnetron Sputtering Sources

6+

Electron Beam Source

Multi Pocket, 5kW or 10kW Power Supplies

Platen

200mm Substrates

  • Heating Up to 1100°C
  • Water-Cooling
  • RF Bias

Load Lock

Single or Multi-Cassette

Software

Full eKLipse™ Control Software/Hardware Suite
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