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Thin Films Systems
Thin Film Systems

High Vacuum Systems
NANO 36™

Compact, full-featured computer controlled PVD tool.

PRO Line PVD Series

R&D, Pilot-production, and production tools.

AXXIS

Glancing Angle Deposition systems.

Ultra High Vacuum Systems
LAB Line

Ultra-High vacuum sputtering systems (10-10 Torr), with up to 15 cathodes. Electron Beam and thermal options available.

CMS Series

Combinatorial Materials Science tool, specifically designed for electron-beam or sputtering applications.

Glove Box Interfaced Systems
NANO 36™

Compact, full-featured computer controlled PVD tool.

SPECTROS™ Series

Glovebox integrated Sputtering, Electron Beam, Thermal, & Organic Evaporation Deposition.

Custom Deposition Systems
Custom Vacuum Systems

Customized solutions for pioneering applications such as TVAC/space simulation, Diamond Like coatings, etc.

Cluster Deposition Systems
OCTOS™

Robotic sample transfer system with up to 10 process modules; Including PVD, ALD, Organics, PLD, CVD, etch; insitu analysis and glovebox options.

Production Systems
BATCH Coaters

Linear batch coaters, and multi-substrate dome coaters for high-throughput applications.

KDF In-Line Solutions

KDF systems can be customized to cover mainstream silicon, emerging materials and flat panel display markets.

Atomic Layer Deposition Systems
ALD150LE™

Thermal Atomic Layer Deposition.

ALD150LX™

Thermal or Plasma-enhanced, load locked Atomic Layer Deposition System.

The Right System for Your Research

The Right System for Your Research

Application Research
Application Research
Perovskite Thin Films for Photovoltaics & Electronics Superconducting PVD Thin Films for Quantum Applications; Qubits & Josephson Junctions PVD of Magnetic Thin Films: Spintronics, GMR & TMR Thin Films & Heusler Alloys
Solid-State Lithium Thin Film Batteries Organic Electronics (OLEDs & OPVs) Reactive Sputtering Research
PVD of Indium Bumps Thin Film Deposition for Lift-Off Processes Physical Vapor Deposition for Medical Devices
Power Your Application Research

Power Your Application Research

Techniques & Capabilities
Techniques & Capabilities
Electron Beam Evaporation Thermal Evaporation Magnetron Sputtering
Organic (Point Source) Evaporation ALD (Atomic Layer Deposition) Multi-Chamber
Glove Box Integration Pulsed Filtered Cathodic Arc Deposition HiPIMS
Techniques That Drive Your Process

Techniques That Drive Your Process

Thin Film Knowledge Base
Thin Film Knowledge Base
Magnetron Performance Optimization Guide Evaporation Process Notes by Material Vacuum Reference Tables Vacuum Technology Concepts Calculators & Conversion Tools Frequently Asked Questions Material Deposition Chart Vacuum Technical Information
System Service & Support
System Service & Support
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High Vacuum Systems

NANO 36
PRO Line PVD 75
PRO Line PVD 200
AXXIS

NANO 36

Affordable Glove Box Integrated Sputtering, Thermal or Low Temperature Evaporation System

PRO Line PVD 75

Modular Design, Allowing Countless Configurations & Multiple Techniques in the Same Chamber

PRO Line PVD 200

Larger Version of the PVD 75 Allowing More Sources & Configurations

AXXIS

Radial Deposition Ports & a Right-Angled Tilting Substrate Stage Facilitates Multiple Deposition Techniques

Magnetron Sputtering Sources

3

6

8

6

Thermal Evaporation Sources

4

4

6

3

Low Temperature Evaporation Sources (LTE)

4

2

2

N/A

Electron Beam Source

N/A

Multi Pocket, 5kW or 10kW Power Supplies

Multi Pocket, 5kW or 10kW Power Supplies

Multi Pocket, 5kW or 10kW Power Supplies

Platen

150mm Substrates

  • Heating Up to 350°C
  • Water-Cooling

150mm Substrates

  • Heating Up to 800°C
  • Water-Cooling
  • RF Bias

200mm Substrates

  • Heating Up to 800°C
  • Water-Cooling
  • RF Bias

Tilting Fixture 200mm Substrates

  • Heating Up to 550°C
  • Water-Cooling
  • Glow Discharge

Load Lock

N/A

Single or Multi-Cassette

Single or Multi-Cassette

Single

Software

Full eKLipse™ Control Software/Hardware Suite

Full eKLipse™ Control Software/Hardware Suite

Full eKLipse™ Control Software/Hardware Suite

Full eKLipse™ Control Software/Hardware Suite

NANO 36

NANO 36Affordable Glove Box Integrated Sputtering, Thermal or Low Temperature Evaporation System

More Info

Magnetron Sputtering Sources

3

Thermal Evaporation Sources

4

Low Temperature Evaporation Sources (LTE)

4

Electron Beam Source

N/A

Platen

150mm Substrates

  • Heating Up to 350°C
  • Water-Cooling

Load Lock

N/A

Software

Full eKLipse™ Control Software/Hardware Suite
PRO Line PVD 75

PRO Line PVD 75Modular Design, Allowing Countless Configurations & Multiple Techniques in the Same Chamber

More Info

Magnetron Sputtering Sources

6

Thermal Evaporation Sources

4

Low Temperature Evaporation Sources (LTE)

2

Electron Beam Source

Multi Pocket, 5kW or 10kW Power Supplies

Platen

150mm Substrates

  • Heating Up to 800°C
  • Water-Cooling
  • RF Bias

Load Lock

Single or Multi-Cassette

Software

Full eKLipse™ Control Software/Hardware Suite
PRO Line PVD 200

PRO Line PVD 200Larger Version of the PVD 75 Allowing More Sources & Configurations

More Info

Magnetron Sputtering Sources

8

Thermal Evaporation Sources

6

Low Temperature Evaporation Sources (LTE)

2

Electron Beam Source

Multi Pocket, 5kW or 10kW Power Supplies

Platen

200mm Substrates

  • Heating Up to 800°C
  • Water-Cooling
  • RF Bias

Load Lock

Single or Multi-Cassette

Software

Full eKLipse™ Control Software/Hardware Suite
AXXIS

AXXISRadial Deposition Ports & a Right-Angled Tilting Substrate Stage Facilitates Multiple Deposition Techniques

More Info

Magnetron Sputtering Sources

6

Thermal Evaporation Sources

3

Low Temperature Evaporation Sources (LTE)

N/A

Electron Beam Source

Multi Pocket, 5kW or 10kW Power Supplies

Platen

Tilting Fixture 200mm Substrates

  • Heating Up to 550°C
  • Water-Cooling
  • Glow Discharge

Load Lock

Single

Software

Full eKLipse™ Control Software/Hardware Suite
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Contact Us - High Vacuum Systems