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Production Vacuum Systems

BATCH Coaters
KDF In-Line Solutions

Magnetron Sputtering Sources

Up to 7 linear cathodes

  • 5" x 15"
  • 5" x 17"
  • 5" x 24"

Up to 4 linear cathodes

  • 5" x 15"
  • 5" x 17"
  • 5" x 24"
  • 5" x 30"

Platen / Deposition Zone

Overall Drum = 30.5" OD x ≈21" LG

  • 1,440 sq/in
  • Heating, Cooling, Bias, Removable Panels
  • Single and Dual Axis Rotation For 3D Components
  • Ion Etch Option

Any Sized Substrate That Fits Within Pallet Area

  • 12" x 12"
  • 20" x 20"
  • 26.5" x 30"
  • Options for RF Bias, Heat over Etch, Backside Cooling

Load Lock

N/A

Dual pallet Standard
Options for Heat and Five Pallet Stacker


Software

Full eKLipse™ Control Software/Hardware Suite

Allen Bradley 'i' PLC with Full Automated Software Control

Magnetron Sputtering Sources

Up to 7 linear cathodes

  • 5" x 15"
  • 5" x 17"
  • 5" x 24"

Platen / Deposition Zone

Overall Drum = 30.5" OD x ≈21" LG

  • 1,440 sq/in
  • Heating, Cooling, Bias, Removable Panels
  • Single and Dual Axis Rotation For 3D Components
  • Ion Etch Option

Load Lock

N/A

Software

Full eKLipse™ Control Software/Hardware Suite

Magnetron Sputtering Sources

Up to 4 linear cathodes

  • 5" x 15"
  • 5" x 17"
  • 5" x 24"
  • 5" x 30"

Platen / Deposition Zone

Any Sized Substrate That Fits Within Pallet Area

  • 12" x 12"
  • 20" x 20"
  • 26.5" x 30"
  • Options for RF Bias, Heat over Etch, Backside Cooling

Load Lock

Dual pallet Standard
Options for Heat and Five Pallet Stacker

Software

Allen Bradley 'i' PLC with Full Automated Software Control
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