TORUS® Circular UHV (Ultra High Vacuum) Magnetron Sputtering Sources
We offer a comprehensive line of circular TORUS® magnetron sputter sources, in 2" and 3" diameters, suited for ultra high vacuum R & D applications. Traditional, flange mounted, welded UHV design with removable magnets from atmosphere during bake out. These sputter sources are "True UHV" cathodes, able to reach base pressures below 10-10 Torr due to their all-welded construction and 350° C bakeout temperature. Their unique high-strength rare earth magnet arrays can be adjusted without breaking vacuum, enabling the user to optimize the sputtering profile. Additionally, these sputter sources are available with an integral gas injection port for introducing the process gas directly to the target.
TORUS UHV Sources feature
- Versatile RF, DC, and Pulsed-DC operation
- True UHV all-welded design (no elastomeric seals)
- Excellent film uniformity (±3%) and target utilization (up to 30%)
- Integral gas injection port to introduce process gas at the target's surface
- Optional deposition chimneys and flip-style shutters reduce contamination during co-deposition
- High-strength rare earth magnet arrays for sputtering magnetic and non-magnetic materials available for 3" UHV source
- Magnet array is isolated from cooling water and can be removed without breaking vacuum
- Standard—Type-N (male) power connectors, indirect water cooling, and balanced magnetic operation
- Unbalanced operation is available (please contact us by clicking here for more information)
- Cathode bakeable to 350°C (with magnet array removed)
Dimensional Drawings
TORUS Dimensions
All TORUS R&D circular sputter sources feature Type-N (male) power connectors, indirect water cooling, and balanced magnetic operation as standard. Unbalanced operation is available, please contact us for more information.
Specifications Table
| Model | TM2U | TM2U | TM3U | TM3U |
|---|---|---|---|---|
| Target Diam. | 2.0" (50.8mm) | 2.0" (50.8mm) | 3.0" (76mm) | 3.0" (76mm) |
| Target Thickness | 0.080" - 0.25" (2mm - 6.3mm) | 0.080" - 0.25" (2mm - 6.3mm) | 0.080" - 0.25" (2mm - 6.3mm) | 0.080" - 0.25" (2mm - 6.3mm) |
| Dim. A | 4" (102mm) | 9.25" (235mm) | 4" (102mm) | 9.25" (235mm) |
| Dim. B | 5.24" (133mm) | 10.49" (266mm) | 5.24" (133mm) | 10.49" (266mm) |
| Dim. E | 12.07" (307mm) | 17.32" (440mm) | 12.07" (307mm) | 17.32" (440mm) |
| Mounting Flange | 6" CF | 6" CF | 6" CF | 6" CF |
NOTE: * Dimensions involving flange-to-target thickness assume a standard target thickness of 1/8 inch. Add or subtract accordingly based on your particular sputter target size.
Start Your Configuration
Select from the configuration options below to create a part number and price for the particular TORUS sputter source required. Example Configuration: TM3US064GF is a 3" OD source mounted on a 4" body (measured from flange to target surface) with a standard magnet array mounted to a 6" CF flange with gas injection and pneumatic flip-style shutter. Example configuration options selected shown in red below.
Ordering Table
Please reference the ordering table below for Magnetron Sputtering Sources that we generally have in stock in one of our global warehouses.
| Target Diameter (in) | Magnet Array | Mounting Style | Length (in) | Gas Chimney | Flange Size | Part Number | Price | In Stock | Add To Cart | |
|---|---|---|---|---|---|---|---|---|---|---|
| Target Diameter (in) | Magnet Array | Mounting Style | Length (in) | Gas Chimney | Flange Size | Part Number | Price | In Stock | Add To Cart | |
| 3 | Standard | UHV / DN100CF (6.00" OD) | 4 (Insertion) | Gas Injection with Chimney | DN100CF (6.00" OD) |
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Accessories Table
| Accessory Type | Description | Reference | Notes | Part Number | Price | In Stock | Add Item | |
|---|---|---|---|---|---|---|---|---|
| Accessory Type | Description | Reference | Notes | Part Number | Price | In Stock | Add Item | |
| 1 | EJCBL3HN | $229.00 |
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| 1 | EJCBL3NN | $114.00 |
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| 1 | EJCBL3NP | $100.00 |
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| 1 | EJCBL3NU | P.O.R. |
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| - | RF03A22XX300 | $9,895.00 |
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