KJLC Silicone Pump Fluids

KJLC 704 & 704-T Features

• Use in identical applications requiring Dow Corning DC 704^®
• Useful in medium and large pumping speed diffusion pumps in a wide variety of research and production applications
• High resistance to oxidation and hydrolysis at operating temperature
• Ideal fluid for aggressive applications requiring ultimate pressures (without trapping) in the 10^-7 Torr range
• With first class LN₂ traps, chamber pressures can approach 10^-11 Torr range
• Applications include vacuum metal casting, diffusion bonding, and instruments (electron microscopes, TOF mass spectrometers, etc.)
• 704-T offers a higher resistance to crystallization

KJLC 705 Features

• Use in identical applications to Dow Corning DC 705® fluid
• Low vapor pressure and low backstreaming rate make LN₂ traps unnecessary for pressures in the 10^-8 Torr range
• With first class LN₂ traps, the ultimate pressure can reach 10^-11 Torr
• The high stability and high spontaneous ignition temperatures of this top-of-the-line diffusion pump fluid make it ideal for use in space-simulation chambers
• Applications include thin film coating systems, inexpensive surface science systems, and plasma physics research

Crystallization / Solidification

Known sensitive applications where 704-T may provide a better solution with a higher resistance to crystallization:

• Optical coaters (lens) with high throughput system
• Oxide deposition applications
• Glass coaters
• Air leaks are present